Monday, November 16, 2020

Ф4 Ultra-high Vacuum Scanning Kelvin Probe

The Ф4 Ultra-high Vacuum Scanning Kelvin Probe system gives the user full access to work function measurements under vacuum with the ability to alter the temperature from 77 K to 860 K. The Kelvin probe measurement has resolution of 1 - 3 meV for a 2 mm tip on a conducting sample. The sample is mounted on a plate that is located on a motorized (x, y, z) translator attached to a stainless steel vacuum chamber. Phi 4 also comes with a photoemission spectroscopy system with a tunable source (3.4 - 7.0 eV). The deep ultra-violet (DUV) light spot measures approximately 3 x 4 mm. Absolute work function measurements can be obtained with this system in the range of 4.0 - 6.5 eV with an accuracy of 0.05 - 0.1 eV.

The system can be upgraded with surface photovoltage spectroscopy through utilizing other ports in the system chamber. Liquid nitrogen is used as the method of cooling the sample and heating is achieved by controllable direct current. Nitrogen gas is used to displace the oxygen to facilitate the use of the photoemission system source. An optical breadboard is used to support the chamber and standard power is required for operation.

Φ4: Scanning, ambient pressure photoemission spectroscopy, surface photovoltage
and surface photovoltage spectroscopy capabilities

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